The Hot-Topic workshop was broken into three (3) segments and provided an overview of the changes to the U.S. and Japanese patent laws, highlighting the changes that will fundamentally affect patent prosecution and licensing practices, and proposing strategies to exploit these changes to achieve cost effective solutions. The workshop began with a brief summary of certain strategic provisions of the new U.S. patent law, the America Invents Act (“AIA”), such as changing the US to a "first to file plus" system. Thereafter, the workshop addressed certain strategic provisions of the new Japanese patent law, including provisions relating to inventor’s and licensee’s rights. The last segment was a synopsis on how the new expanded US post-issuance proceedings could be employed as cost effective alternatives/supplements to litigation and adjunct to patent licensing negotiations, and proposed strategies employing these post-issuance proceedings to respond to offers to license or infringement threats, including those from Non-Practicing Entities.
May 06, 2013
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